N-methyl-2-pyrrolidone (NMP) can be used in wafer pre-cleaning, as well as in cleaning and degreasing applications. Other products used in wafer treatment and preparation include diethyl ether, ethyl alcohol, Arcosolv propylene glycol ethers and acetates and TBAc tertiary butyl ether.
Arcosolv and TBAc are trademarks owned or used by LyondellBasell group companies. Trademark Arcosolv is registered in the U.S. Patent and Trademark Office.